Obtaining Protection for Mask Works in the U. S
I. Background The U.S. mask work registration law was first enacted in 1984. Semiconductor Chip Protection Act of 1984, 17 U.S.C. §§ 901-14 (“SCPA”). The SCPA was enacted in the early days of IC fabrication in response to certain identified acts of IC copying. However, until very recently, mask work registrations in the U.S. were […]